High temperature CVD system for nano-wires (ZnO, C, etc.) and graphene research.

  • Base Pressure < 2x10-7 Torr
  • Leak Rate 10-8 Torr.l/s
  • Vacuum chamber Quartz body
  • Split Type Tube Furnace Horizontal design
  • Quartz Tube Diameter Maks.75 mm​
  • Max. Temperature  1100oC
  • Continuous Working Temperature 1050oC
  • Heating Area Length  250 mm
  • Temperature Control System  PID method
  • Gas Flow 1 MFC for Ar additional MFCs are optional
  • Control Full Automation on PC
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For more detailed information, send an e-mail to info@vaksis.com.

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