MiDASm PVD MT 2M2T New Model
Multi Technique Thin Film Deposition System:
This system can be used for deposition of maximum four different materials on a single substrate using sputtering and thermal evaporation techniques.
- Base Pressure < 5x10-8 Torr
- Leak Rate < 10-8 Torr.l/s
- Substrate Size 4" diameter
- Substrate Heating Max. 800 oC
- Substrate Rotation 3 - 30 rpm
- Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
- Sources 2 Resistive Thermal Evaporation, 2 Sputtering Magnetrons
- Deposition Mode Upward
- Power Generators 1 DC (500 W) and 1 RF (300 W)
- Control Full automation by PC
For more detailed information, send an e-mail to info@vaksis.com.
