PVD handy 3T
Designed and manufactured to deposit controlled nano- and micro-meter-thick thin films/coatings on flat surfaces of max. 4" diameter wafers or glass. Includes three thermal evaporation sources.
- Base Pressure < 2x10-7 Torr
- Leak Rate < 10-8 Torr.l/s
- Substrate Size 4" diameter
- Substrate Heating Max. 500 oC
- Substrate Rotation 3 - 30 rpm
- Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
- Deposition Method Resistive Thermal Evaporation
- Deposition Mode Upward (all sources)
- Number of Sources 3
- Loading From top
- Control Full automation by PC
For more detailed information, send an e-mail to info@vaksis.com.
