Bor-N Ceramic Coating System
This system includes maximum four magnetron sputtering sources. The system is designed and manufactured for deposition of boron nitride layers on different substrates.
- Base Pressure < 2x10-7 Torr
- Substrate Size Max. 3"
- Substrate Heating 500 oC
- Substrate Rotation 3-30 rpm
- Substrate Bias RF or DC
- Gas Flow MFC for gases
- Thickness measurement In-situ measurement with Quartz X-tal Oscillator
- Control Fully Automatic
For more detailed information, send an e-mail to info@vaksis.com.
