ANGORA PVD 4M
This system can be used for deposition of maximum four different materials on a single substrate using sputtering technique.
- Base Pressure < 2x10-7 Torr
- Substrate Size: 4" diameter
- Substrate Bias: RF or DC
- Substrate Heating: 500oC
- Substrate Cooling: Water-Cooled
- Substrate Rotation: 1-30 rpm
- Deposition Method: Saçtırma
- Deposition Mode: Upward
- Number of Sources: 4 off 2" magnetrons
- Gas Flow: 1 MFC for Ar other MFCs are optional
- Thickness Measurement: In-situ measurement with Quartz X-tal Oscillator
- Power Generators: 1 Pulsed RF and 1 Pulsed DC
- Loading: From the top
- Control: Full automation by PC
For more detailed information, send an e-mail to info@vaksis.com.
