PVD handy twin
PVD-handy / Twin series is a part of Vaksis PVD – handy platform. This series is really convenient for use and easily handled as the adjective “handy” described in the dictionary which involves different techniques and combinations.
- Base Pressure: ≈ 2x10-7 Torr
- Number of Chambers 2
- Substrate Size 4” diameter
- Substrate Heating max. 500oC
- Substrate Rotation: 3-30 rpm
- Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
- Deposition Mode Upward
- Loading From the swig open bell jar
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POWER SOURCES
- DC and/or RF Power Supply for Sputtering Magnetron Source
- Effusion Cell A.C. Power for Metal and/or OLED Evaporation Sources
- High Current Low Voltage Power Supply for Resistive Thermal Evaporation Source
- Power Supply for Electron Beam Evaporation Source
