PVD handy 6T Twin
This system is comprised of two chambers. Each chamber can be used for deposition of maximum three different materials on a single substrate using thermal evaporation technique.
- Base Pressure < 2x10-7 Torr
- Leak Rate < 10-8 Torr.l/s
- Substrate Size 3" diameter
- Substrate Heating Max. 500 oC
- Substrate Rotation 3 - 30 rpm
- Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
- Number of Sources 6 Resistive thermal evaporation sources
- Deposition Mode Upward (all sources)
- Control Full automatic pumping, manual evaporation
For more detailed information, send an e-mail to info@vaksis.com.
