MiDAS PVD 5F
Evaporation system with five furnace-type effusion cells for metals such as Cu, In, Ga, Se, Cd, etc. The system allows multi-layer deposition of five dissimilar materials or co-deposition of up to five dissimilar materials in the same loading.
- Base Pressure < 5x10-8 Torr
- Leak Rate < 10-8 Torr.l/s
- Substrate Size 5" diameter
- Substrate Heating Max. 800 oC
- Substrate Rotation 3 - 30 rpm
- Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
- Number of Sources 5 Furnace-type effusion cells
- Number of Thickness Sensors Up to 5
- Power Generators 5
- Control Full automation by PC
For more detailed information, send an e-mail to info@vaksis.com.
