ANGORA
Vaksis ANGORA platform is composed of box-type vacuum chambers and can be used for deposition of four different materials on a single substrate.
- Ultimate Vacuum Pressure ≤ 5x10-7 Torr
- Substrate Size 4” diameter
- Substrate Heating max. 800oC
- Substrate Rotation 3-30 rpm
- Cooling Where necessary
- Deposition Mode Upward
- Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
- Control Fully Automatic
DOWNLOAD BROCHURE
POWER SOURCES
- DC and/or RF Power Supply for Sputtering Magnetron Source
- Effusion Cell A.C. Power Supply for Metal and/or Organic Evaporation Sources
- High-Current Low-Voltage A.C. Power Supply for Resistive Thermal Evaporation Source
- Power Supply for Electron Beam Evaporation Source
