MiDAS PVD 1eB
This system can be used for deposition of maximum four different materials on a single substrate using electron beam evaporation technique.
- Base Pressure ≤ 5x10-7 Torr
- Substrate Size 4” diameter
- Substrate Heating up to 650oC
- Substrate Rotation 3-30 rpm
- Deposition Mode Upward
- Number of Sources One e-beam evaporator source with 4 crucibles
- Crucible Size 8 cc each
- Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
- Control Fully Automatic
For more detailed information, send an e-mail to info@vaksis.com.
