PVD handy 1M sm
Special design sputtering system with one magnetron source and manual control for low budget projects.
Designed and manufactured to deposit controlled nanao- and micro-meter-tick thin films/coatings on flat surfaces of max. 25 mm diameter wafers or glass.
- Base Pressure < 2x10-7 Torr
- Leak Rate < 10-8 Torr.l/s
- High-speed Pump: 70 l/s turbo pump
- Mechanical Pump: 1 m3/h oil-free mechanical pump
- Substrate Size: 25 mm diameter
- Thickness Measurement: In-situ measurement with Quartz X-tal Oscillator (Optional)
- Power Supply: 1 DC 500 W (Optional: 1 RF 300 W)
- Deposition Method: Sputtering
- Deposition Mode: Downward
- Number of Source: 1
- Loading: From top
- Control: Manual
For more detailed information, send an e-mail to info@vaksis.com.
