PVD handy
Vaksis PVD–handy series is really convenient for use and easily handled as the adjective “handy” described in the dictionary. The system allow multi-layer deposition in tha same loading..
- Base pressure ≈ 2x10-7 Torr
- Substrate Size max. 4” diameter
- Substrate Heating max. 500oC
- Substrate Rotation 10 rpm
- Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
- Temperature Controlling System PID method
- Loading From the swing open bell jar
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POWER SOURCES
- DC and/or RF Power Supply for Sputtering Magnetron Source
- Effusion Cell A.C. Power Supply for Metal and/or Organic Evaporation Sources
- High-Current Low-Voltage A.C. Power Supply for Resistive Thermal Evaporation Source
