PVD handy 1M1O1T
This system can be used for deposition of maximum three different materials on a single substrate using thermal evaporation, organic evaporation and sputtering techniques.
- Base Pressure < 2x10-7 Torr
- Substrate Size 3" diameter
- Substrate Heating 350 oC
- Number of Thermal Evaporation Source 1
- Number of OLED/OPV Source 1
- Number of RF/DC Magnetron 1
- Power Generator 1 DC 500 W (RF 300 W is optional)
- Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
- Control Full automation by PC
For more detailed information, send an e-mail to info@vaksis.com.
