MiDAS in Glovebox
Glovebox Entegrated Thin Film Deposition System:
This system is comprised of two chambers and two gloveboxes. One chamber includes six effusion cells and the other chamber includes four thermal evaporation sources.
- Base Pressure < 5x10-8 Torr
- Leak Rate < 10-8 Torr.l/s
- Substrate Heating Max. 800 oC
- Substrate Rotation 3 - 30 rpm
- Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
- Control Full automation by PC
Glovebox
- Material 304 Stainless Steel, Butyl Rubber Gloves
- Flow Rate 45 m3/hr
- Leak Rate < 0.001 vol%/hr According to ISO 10648-2 Procedure
- Purity Level
- Standard < 1 ppm O2, H2O in Nitrogen, Argon or Helium
- Optional Ultra High Purity System < 0.1 ppm O2, H2O
For more detailed information, send an e-mail to info@vaksis.com.
