PVD handy 2T sm
Special design evaporation system with dual thermal evaporation sources and manual control for low budget projects.
Designed and manufactured to deposit controlled nano- and micro-meter-thick thin films/coatings on that flat surfaces of max. 40 mm diameter wafers or glass.
- Base Pressure < 2x10-7 Torr
- Leak Rate < 10-8 Torr.l/s
- High-speed Pump: 700 l/s diffusion pump
- Mechanical Pump: 2.5 m3/h Dual Stage mechanical pump
- Substrate Size: 40 mm diameter
- Thickness Measurement: In-situ measurement with Quartz X-tal Oscillator
- Deposition Mode: Upward (all sources)
- Number of Sources: 2
- Loading: From top
- Control: Full automatic pumping, manual evaporation
For more detailed information, send an e-mail to info@vaksis.com.
